 |
| ( A ) Upper Region |
- |
Plasma density is lesser as indicate by pale UV
light, because there are much more positive charge ions than negative
charge electrons, reaction is slow. |
| ( B ) High Plasma |
- |
Region where the most visible UV light emitted
by the fast ion reaction. There is approximately equal numbers
of negative charge ions and positive charge electrons. Ions gain
more acceleration as it approach near the Sheath. |
| ( C ) Lower
Region (SHEATH) |
- |
This region is called the SHEATH where there is
strong electric field in front or on top of the power electrode, |
| - |
Sheaths are of critical importance for plasma etching,
since positive ions are accelerated toward the surface when entering
a sheath. The accelerated ions bombard the surface with energies
that are much greater than thermal energies. |
| MAGNETIC
RADIATION BELT |
- |
Geomagnetic fields lines form by RF electric fields,
the plasma is acted upon by electric and magnetic fields created
within the plasma itself through localized charge concentration
and electric currents that result from the differential motion
of the ions and electrons. |
| - |
This is one big phenomena that influence the direction
of charge particles. |