Gas Plasma Etcher PR500/510

Gas Plasma Etcher

PR500/510

Model
500	510
Method
Barrel type of DP DP : direct plasma
High-frequency Output
Max.500W
Oscillating Frequency
13.56MHz
Reaction Chamber
ø215×305mm

The PR500/510 is a gas plasma device that is used widely for such applications as production of semiconductors and analysis work. It boasts outstanding operability and safety, with an automatic tuning system as a standard component and other features.

It has a compact design, with a small-size HF generator and an oscillation section integrated with a portion of the chamber.
With the 215mm diameter large caliber chamber, the unit can process big testing samples.

The gas plasma equipment has a wide range of applications from ashing, etching, dry cleaning, etc.

PR500

PR510

Reaction Chamber	Control Panel
With the 215mm diameter large caliber chamber	FORWARD/REFLECT indicate by digital

Operation Flowchart

Piping System Diagram

Specifications

Model	PR500	PR510
Method	Barrel type of direct plasma
Control part
High frequency output	Max. 500W
Oscillating frequency	13.56 MHz
Output impedance	50Ω
Tuning method	Automatic tuning
Instrument	Output watt meter (0 to 600W) Reflected wave watt meter (0 to 300W) Vacuum gauge, thermocouple type Flow meter, needle valve integrated type, 2 sets
Timer	0.1sec. to 999h
Gas inlet	1/4" stainless steel, 2 inlet
Power source (50/60Hz)	AC 100/220V, single phase, 2 kVA
Reaction part
Reaction chamber	Made of quarts, φ215×305mm
Electrode structure	Condenser type, 4-way split
Control system	Auto pressure reduction, auto leak valve	Touch panel with PLC control
Piping material	SUS, Teflon
External dimensions(W×D×Hmm)	438×520×760	520×630×760
Weight	Approx. 38kg	Approx. 60kg
Standard Accessories
	Connection cable : 1 complete set Vacuum grease : 1 pc. O-ring for reaction chamber : 1 pc.
Optional Accessories
Frame for wafers, 2, 3, 4, 5, 6 inches Multipurpose angled frame Aluminum etching tunnel Stand

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