| Plasma Model |
| RIE/DP |
RIE : Reactive Ion Etching
DP : Direct Plasma |
| RF Generator |
| 10 to 500W |
| Oscillating Frequency |
| 13.56MHz |
| Chamber Size (mm) |
| 344W×230D×45H |
|
In-Line and Stand Alone Type (Strip to Strip process)
Outline
Two lead frame (strip) vertical or parallel loading function. Pull out two strip from
Magazine--Loading two strip into the chamber--Plasuma cleaning process--Unloading
two strip from chamber--Strip goes to magazine or next process to direct.
Total system controlled by PLC controller. LCD touch panel display and operation.
Lead frame (strip) size--Up to 25 to 80(W)×100 to 250(L)×0.2 to 2.5(t)mm also.
We can provide Customized In-Line plasma.
Feature
- Special electrode built in for getting good plasma efficient.
- RIE/DP mode selectable
- RF power up to 500W
- All automatic operation
- LCD touch panel and PLC control
- Any chamber size are available for customer's Lead frame or strip.
ISP500LU |
|